Daily Moisturizer Broad Spectrum SPF 30

What it is: A lightweight moisturizer that provides powerful hydration with invisible, broad-spectrum sun protection.

Skin Type: Normal, Dry, Combination, and Oily

Skincare Concerns: Dryness

Formulation: Cream

Highlighted Ingredients:
- Squalane: A plant-based, lipid-rich moisturizer that softens skin.
- Niacinamide: A form of vitamin B3 that brightens and balances skin’s appearance.

Ingredient Callouts: This product is cruelty-free.

What Else You Need to Know: This moisturizer provides broad-spectrum UVA/UVB SPF 30 protection and is invisible on all skin tones. It’s lightweight, nongreasy, won`t clog the appearance of pores, and layers well with skincare and makeup.

Clinical Results: In a consumer perception study:
- 100% said the formula blends invisibly into skin
- 96% said skin feels hydrated immediately and over time
- 93% said skin feels balanced with immediate oil control

Clean at Sephora
Clean at Sephora is a curation of brands committed to evolving the beauty industry. When you see our Clean seal, you can be sure this brand`s products are formulated without certain ingredients that are potentially harmful to human health and the environment and also address ingredients clients are concerned about, including phthalates, formaldehyde or formaldehyde releasers, oxybenzone and octinoxate, hydroquinone, triclosan, coal tar, methylisothiazolinone and methylchloroisothiazolinone, insoluble plastic microbeads, and more. For the full list, check out the Ingredients tab.

-Squalane: A plant-based, lipid-rich moisturizer that softens skin.
-Niacinamide: A form of vitamin B3 that brightens and balances skin’s appearance.

Avobenzone 3.0% Homosalate 9.0% Octisalate 5.0% Octocrylene 7.0%, Water (Aqua), Glycerin, Polyglyceryl-3 Distearate, Niacinamide, Aluminum Starch Octenylsuccinate, Dimethicone, Phenoxyethanol, Trehalose, Silica, Palmitoyl Tripeptide-1, Palmitoyl Tetrapeptide-7, Chamomilla Recutita (Matricaria) Flower Water, Panthenol, Squalane, Butylene Glycol, Stearic Acid, Palmitic Acid, Cetearyl Olivate, Sorbitan Olivate, Cetearyl Alcohol, Glyceryl Stearate Citrate, Stearyl Heptanoate, Stearyl Caprylate,Polyacrylate Crosspolymer-6, Acrylates/Polytrimethylsiloxymethacrylate Copolymer, Coco- Glucoside, Carbomer, Caprylyl Glycol, Ethylhexylglycerin, Disodium EDTA.

Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category—this is not an exhaustive list):
Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytoluene (BHT) under 0.1%, Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Paraffin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos), Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1,4-Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1,4-Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%).

Suggested Usage:
-Use as the last step of your daily skincare ritual.
-Massage evenly onto face and neck.
-Reapply every two hours when exposed to sunlight.
-To complete the ritual, recite the affirmation during application.