Face Mask

What it is: A calming and deeply hydrating face mask packed with potent ingredient purslane to support skin regeneration and hydration.

Skin Type: Normal, Dry, Combination, and Oily

Skincare Concerns: Fine Lines and Wrinkles, Redness, and Loss of Firmness and Elasticity

Formulation: Mask

Highlighted Ingredients:
- Aloe Vera and Chamomile: Provide intense moisture and calm the skin.
- Purslane: A strong antioxidant that stimulates the body and supports skin health and rejuvenation.
- Kaolin: Leaves the skin with a silky-soft feel.

Ingredient Callouts: This product is vegan, cruelty-free, and gluten-free.

What Else You Need to Know: This deeply hydrating Face Mask is perfect for traveling or whenever your stressed skin needs an instant hydration boost. Purslane, a strong antioxidant, also stimulates the body to form telomerase enzymes, thus supporting the body’s natural skin regeneration. Calming aloe vera and chamomile infuse the mask with moisture while kaolin, also known as ‘China clay,’ leaves your complexion feeling silky-soft and supple.

As an aesthetic doctor with a background in anti-inflammatory medicine, Dr. Sturm is committed to treating the skin with scientifically-proven ingredients and non-aggressive natural extracts. The three pillars of Dr. Barbara Sturm Molecular Cosmetics—hydration, boosting the skin’s natural barrier function, and reducing the visible signs of irritation—help to promote healthy skin that glows from within over time.

Clean at Sephora
Clean at Sephora is a curation of brands committed to evolving the beauty industry. When you see our Clean seal, you can be sure this brand`s products are formulated without certain ingredients that are potentially harmful to human health and the environment and also address ingredients clients are concerned about, including phthalates, formaldehyde or formaldehyde releasers, oxybenzone and octinoxate, hydroquinone, triclosan, coal tar, methylisothiazolinone and methylchloroisothiazolinone, insoluble plastic microbeads, and more. For the full list, check out the Ingredients tab.

-Aloe Vera and Chamomile: Provide intense moisture and calm the skin.
-Purslane: A strong antioxidant that stimulates the body and supports skin health and rejuvenation.
-Kaolin: Leaves the skin with a silky-soft feel.

Water, Kaolin, Glycerin, Prunus Amygdalus Dulcis (Sweet Almond) Oil, Lactobacillus/Portulaca Oleracea Ferment Extract, Decyl Oleate, Xanthan Gum, Tocopheryl Acetate, Aloe Barbadensis Leaf Juice, Phenoxyethanol, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Butylene Glycol, Chamomilla Recutita (Matricaria) Flower Extract, Sodium Hydroxide, Ethylhexylglycerin, Leuconostoc/Radish Root Ferment Filtrate.

Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category – this is not an exhaustive list):
Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytulolene (BHT) under 0.1% , Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Parrafin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos) , Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1, 4, Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1’4 Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%)

Suggested Usage:
-Apply two to three times a week, after cleansing.
-Leave it on for 10 to 15 minutes before taking it off with lukewarm water.
-For an intensive treatment, leave it on until the mask has dried before peeling it off in gentle motions.
-Follow with your regular moisturizer.