The Quench Quadralipid Rapid Recovery Facial Moisturizer

What it is: A cream that supports skin’s protective barrier within the first five minutes of use.

Skin Type: Normal, Dry, Combination, and Oily

Skincare Concerns: Loss of Firmness and Elasticity, Fine Lines and Wrinkles, and Dryness

Formulation: Rich Cream

Highlighted Ingredients:
- Natural Cholesterol: Helps skin hold hydration.
- Lactic Acid: Helps to firm skin’s appearance.
- Sunflower Seed Oil: Hydrates and helps prevent moister loss.

Ingredient Callouts: This product is cruelty-free, and gluten-free, and comes in recyclable packaging.

What Else You Need to Know: This intensely nurturing facial cream with Quadralipid Technology works to support the four key lipids responsible for skin`s protective barrier function, elasticity, hydration, and radiance. It is the ideal recovery cream for dry climates, dry skin, long flights, and post-retinol or microneedling treatments.

Clinical Results: In a consumer-perception survey after using The Quench Quadralipid Rapid Recovery Facial Moisturizer:
- 100% felt skin was instantly more hydrated after first use
- 100% agreed skin felt softer after application
- 97% noticed skin felt smoother after using

Clean at Sephora
Clean at Sephora is a curation of brands committed to evolving the beauty industry. When you see our Clean seal, you can be sure this brand`s products are formulated without certain ingredients that are potentially harmful to human health and the environment and also address ingredients clients are concerned about, including phthalates, formaldehyde or formaldehyde releasers, oxybenzone and octinoxate, hydroquinone, triclosan, coal tar, methylisothiazolinone and methylchloroisothiazolinone, insoluble plastic microbeads, and more. For the full list, check out the Ingredients tab.

-Natural Cholesterol: Helps skin hold hydration.
-Lactic Acid: Helps to firm skin’s appearance.
-Sunflower Seed Oil: Hydrates and helps prevent moister loss.

Water, Dimethicone, Hydrogenated Polyisobutene, Glycerin, C12-15 Alkyl Benzoate, Helianthus Annuus (Sunflower) Seed Oil Unsaponifiables, Bis-Peg-18 Methyl Ether Dimethyl Silane, Sodium Lauroyl Lactylate, Isododecane, Beeswax (Cera Alba), Dimethicone/Peg-10/15 Crosspolymer, Lauryl Peg-9 Polydimethylsiloxyethyl Dimethicone, Dimethicone/Vinyl Dimethicone Crosspolymer, Butylene Glycol, Phytosphingosine, Ceramide Ng, Ceramide Ap, Cholesterol, Ceramide Np, Palmitoyl Hexapeptide-12, Ceramide Eop, Tribehenin, Peg/Ppg-18/18 Dimethicone, Peg-10 Dimethicone,Disteardimonium Hectorite, Disodium Edta, Sodium Chloride, Phenoxyethanol, Silica, Carbomer, Propylene Carbonate, Xanthan Gum, Fragrance, Peg-10 Rapeseed Sterol, Benzoic Acid, Sorbic Acid, Chlorphenesin, Lactic Acid, Dipropylene Glycol, Ethylhexylglycerin, Tocopherol.



Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category – this is not an exhaustive list):
Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytulolene (BHT) under 0.1% , Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Parrafin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos) , Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1, 4, Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1’4 Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%)

Suggested Usage:
-Use the wand provided to apply in the AM and PM after cleansing.